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Proceedings Paper

Effects of thickness and substrate temperature on the electrical and optical properties of In2O3-ZnO films
Author(s): Yu Pei; Fachun Lai; Limei Lin; Liqin Fan; Yan Qu; Rong Chen
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Paper Abstract

The influences of thickness (d) and substrate temperature (Ts) on electrical and optical properties of In2O3-ZnO (IZO) films are investigated. IZO films are deposited on quartz substrates by reactive direct current magnetron sputtering. The target is 80 wt.% In2O3 and 20 wt.% ZnO mixtures. d of the films deposited at room temperature varied from 63 to 651 nm. Ts of the films with thickness of about 200 nm varied from room temperature to 400 °C. Transmittances of the films are measured by spectrophotometer. The electrical properties such as resistivity, carrier concentration and mobility are studied by van der Pauw method. Experimental results show that the resistivity (ρ) monotonously decreases from about 1.2 × 10-3 to 5.0 × 10-4 Ωcm when d increases from 63 to 300 nm. As d=160 nm, the average transmittance in visible spectral region has a maximum (87%). Additionally, the average transmittances in visible spectral region for all the films deposited at different Ts are about 82%, but the transmittance in near infrared spectral region decreases with the increase of Ts. When Ts increases from 100 °C to 400 °C, ρ and mobility monotonously decrease, but carrier concentration increases.

Paper Details

Date Published: 20 May 2009
PDF: 6 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 728215 (20 May 2009); doi: 10.1117/12.830824
Show Author Affiliations
Yu Pei, Fujian Normal Univ. (China)
Fachun Lai, Fujian Normal Univ. (China)
Limei Lin, Fujian Normal Univ. (China)
Liqin Fan, Fujian Normal Univ. (China)
Yan Qu, Fujian Normal Univ. (China)
Rong Chen, Fujian Normal Univ. (China)


Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)

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