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Proceedings Paper

Methods for increasing the etching uniformity of ion beam multiple mask
Author(s): Xiaobo Zhang; Ying Xiong; Qiang Liu; Yangchao Tian
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Paper Abstract

With uniform illumination, multi-step diffractive optical elements (DOE) are fabricated with ion beam multiple mask etching technology. According to the technical process of ion beam multiple mask etching on DOE, a distribution of surface error based on LKJ-150 ion beam etching machine is presented. Numerical analysis indicates that the surface distribution of etching error results in lower performance of multi-step DOE, which consumedly reduces the uniformity of target field with uniform illumination. After each etching process, the sample i.e, multi-step DOE fabricated by LKJ-150 ion beam etching machine is measured. Through measurement data, we get the etching error. On the basis of etching error, the mask can be made. Numerical analysis shows this method can reduce the impact of surface error on the performance of DOE and increase the etching uniformity of. ion beam multiple mask

Paper Details

Date Published: 20 May 2009
PDF: 5 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 728213 (20 May 2009); doi: 10.1117/12.830822
Show Author Affiliations
Xiaobo Zhang, Univ. of Science and Technology of China (China)
Ying Xiong, Univ. of Science and Technology of China (China)
Qiang Liu, Univ. of Science and Technology of China (China)
Yangchao Tian, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)

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