Share Email Print
cover

Proceedings Paper

Research of optical flats in pad polishing
Author(s): Jian Wang; Yinbiao Guo; Yaguo Lee; Qiao Xu; Wei Yang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The influence of polishing an optical workpiece with a polyurethane pad is examined in this paper, including material removal rate, surface roughness and surface form error. Usually, optical polishing pitch is applied to polish optical workpieces, but the material removal rate (MRR) of pitch is quite low, and polyurethane foam is thus substituted for polishing pitch. With the polyurethane pad a much higher MRR is obtained. Surface roughness and surface error form of workpieces are also examined. We are gratified to find that there is surface form error and surface roughness is comparable to the result of pitch polishing.

Paper Details

Date Published: 20 May 2009
PDF: 5 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72820X (20 May 2009); doi: 10.1117/12.830815
Show Author Affiliations
Jian Wang, Xiamen Univ. (China)
Chengdu Fine Optical Engineering Research Ctr. (China)
Yinbiao Guo, Chengdu Fine Optical Engineering Research Ctr. (China)
Yaguo Lee, Xiamen Univ. (China)
Qiao Xu, Xiamen Univ. (China)
Wei Yang, Chengdu Fine Optical Engineering Research Ctr. (China)


Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)

© SPIE. Terms of Use
Back to Top