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Proceedings Paper

Infrared antireflection DLC films by femtosecond pulsed laser deposition
Author(s): Shuyun Wang; Yanlong Guo; Xiaobing Wang; Yong Cheng; Huisheng Wang; Xu Liu
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Paper Abstract

Diamond-like Carbon(DLC) films are deposited by Ti:Sapphire femtosecond pulsed laser(800nm, 120fs-2ps, 3.3W, 1-1000Hz) at room temperature. The substrate is n-type Si(100), and the target is 99.999%-purity graphite. After a great lot of experiments, optimal technical parameters, which are 1000Hz repetition frequency, 120fs pulse-width, 5cm-distance between target and underlay and 1014W/cm2 power-density, were used to deposite 443nm thick DLC film. Raman spectrum measurement shows a broad peak with a center at 1550 cm-1 for all films, similar to those of typical diamond-like carbon films prepared using other methods. And sp3-bond content reaches 67% analyzed by XPS. There is no nick on the film when scraped 105 times by a RS-5600 friction test machine under the pressure of 9.8N. The infrared transmittance increases along with the oxygen pressure when between 0.03 Pa and 2 Pa. The result shows that oxygen is effective in etching sp2-bond content. The extreme infrared transmittance of Si slice deposited DLC film on single surface is higher than 64% at 3-5μm, superior to 53% when being uncoated.

Paper Details

Date Published: 21 May 2009
PDF: 5 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72820R (21 May 2009); doi: 10.1117/12.830809
Show Author Affiliations
Shuyun Wang, Wuhan Ordnance Non-Commissioned Officers Academy (China)
Yanlong Guo, Wuhan Ordnance Non-Commissioned Officers Academy (China)
Xiaobing Wang, Wuhan Ordnance Non-Commissioned Officers Academy (China)
Yong Cheng, Wuhan Ordnance Non-Commissioned Officers Academy (China)
Huisheng Wang, Wuhan Ordnance Non-Commissioned Officers Academy (China)
Xu Liu, Wuhan Ordnance Non-Commissioned Officers Academy (China)


Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)

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