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Proceedings Paper

Two-fluid cleaning technology for advanced photomask
Author(s): Tsutomu Kikuchi; Nobuo Kobayashi; Yoshiaki Kurokawa; Harumichi Hirose; Mikio Nonaka
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Paper Abstract

Along with the increased miniaturization of electronic devices, two-fluid cleaning technology is garnering the spotlight as a solution for the manufacturing process of Photomask. This is because it is now known that implementing energy control of the particles that are sprayed on the substrate allows cleaning of miniature patterns. However, it is not yet clear just how miniature of a pattern is cleanable with two-fluid cleaning technology. This study discusses mechanisms to miniaturize the droplets created by a two-fluid nozzle. In addition, this study also considers the impact of droplet size on pattern damage to the Photomask and speaks on the potential for applying two-fluid cleaning technology in the future.

Paper Details

Date Published: 11 May 2009
PDF: 11 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73791Y (11 May 2009); doi: 10.1117/12.830602
Show Author Affiliations
Tsutomu Kikuchi, Shibaura Mechatronics Corp. (Japan)
Nobuo Kobayashi, Shibaura Mechatronics Corp. (Japan)
Yoshiaki Kurokawa, Shibaura Mechatronics Corp. (Japan)
Harumichi Hirose, Shibaura Mechatronics Corp. (Japan)
Mikio Nonaka, Shibaura Mechatronics Corp. (Japan)

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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