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Proceedings Paper

Model-based assist features
Author(s): Bayram Yenikaya; Oleg Alexandrov; Yongjun Kwon; Anwei Liu; Ali Mokhberi; Apo Sezginer
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Paper Abstract

In a recent paper15, we presented a novel method for fully automated model-based generation and optimization of sub-resolution assist features which, when placed on a contact layer photomask, minimize the variations in the printed pattern with respect to focus change. Here we extend that methodology to improve the contrast of the light intensity in addition to minimizing variations caused by focus change.

Paper Details

Date Published: 23 September 2009
PDF: 6 pages
Proc. SPIE 7488, Photomask Technology 2009, 748815 (23 September 2009); doi: 10.1117/12.829938
Show Author Affiliations
Bayram Yenikaya, Cadence Design Systems, Inc. (United States)
Oleg Alexandrov, Cadence Design Systems, Inc. (United States)
Yongjun Kwon, Cadence Design Systems, Inc. (United States)
Anwei Liu, Cadence Design Systems, Inc. (United States)
Ali Mokhberi, Cadence Design Systems, Inc. (United States)
Apo Sezginer, Cadence Design Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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