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Proceedings Paper

Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics
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Paper Abstract

A novel EUV mask inspection tool with 199nm laser source and super-resolution technique has been developed. This tool is based on NPI-5000PLUS, which is a photo-mask inspection tool for hp2X nm node and beyond. In order to implement EUV mask inspection with only a short time for mask set-up, reflected illumination type alignment optics to guide alignment mark and adjust mask coordinate with visible illumination light are equipped. Moreover, to inspect EUV masks for hp2X nm and beyond, the image detection optics with the novel polarized illumination technique is incorporated in this tool. Image contrast enhancement was confirmed by experiments and simulations.

Paper Details

Date Published: 30 September 2009
PDF: 8 pages
Proc. SPIE 7488, Photomask Technology 2009, 74882O (30 September 2009); doi: 10.1117/12.829747
Show Author Affiliations
Nobutaka Kikuiri, Advanced Mask Inspection Technology, Inc. (Japan)
Masatoshi Hirono, Advanced Mask Inspection Technology, Inc. (Japan)
Ryoichi Hirano, Advanced Mask Inspection Technology, Inc. (Japan)
Tsuyoshi Amano, Semiconductor Leading Edge Technologies, Inc. (Japan)
Osamu Suga, Semiconductor Leading Edge Technologies, Inc. (Japan)
Hiroyuki Shigemura, Semiconductor Leading Edge Technologies, Inc. (Japan)
Hideaki Hashimoto, Nuflare Technology, Inc. (Japan)
Kenichi Takahara, Nuflare Technology, Inc. (Japan)
Kinya Usuda, Nuflare Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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