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Proceedings Paper

Printability verification function of mask inspection system
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Paper Abstract

In addition to the conventional demands for high sensitivities with which the mask inspection system detects the minute size defects, capability to extract true defects from a wide variety of patterns that should not be counted as pseudo defects has been quite demanding. It is necessary to ascertain suppression of MEEF incurred by the combination of parameters such as LER and defects of SRAF. NFT and Brion are jointly developing a mask-image based printability verification system with functions combining their respective technologies with the results from ASET's research. This report describes such defect detection results and introduces the development of a mask inspection system with printability verification function.

Paper Details

Date Published: 23 September 2009
PDF: 9 pages
Proc. SPIE 7488, Photomask Technology 2009, 74880B (23 September 2009); doi: 10.1117/12.829739
Show Author Affiliations
Hideo Tsuchiya, Association of Super-Advanced Electronics Technologies (Japan)
NuFlare Technology, Inc. (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)
Masakazu Tokita, Association of Super-Advanced Electronics Technologies (Japan)
Kenichi Takahara, Association of Super-Advanced Electronics Technologies (Japan)
Kinya Usuda, Advanced Mask Inspection Technology Inc. (Japan)
NuFlare Technology, Inc. (Japan)
Fumio Ozaki, Advanced Mask Inspection Technology, Inc. (Japan)
Nobutaka Kikuiri, Advanced Mask Inspection Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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