Share Email Print
cover

Proceedings Paper

What is a good empirical model?
Author(s): Eldar Khaliullin; Yaogang Lian; Mark Davey; Xin Zhou
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

An accurately predictive process model is of utmost importance to the traditional Optical Proximity Correction (OPC), the leading-edge Inverse Lithography Technology (ILT), or other simulation software for IC manufacturing. There are many parameters and methods in constructing and calibrating a model. But it is difficult to obtain a good empirical model, partly because the assessment of the final result is lacking in terms of quantitative and objective metrics. We set out to define certain practical guidelines, e.g. Model Effectiveness Standard Index (MESI), for analyzing parameter uncertainty and estimating simulation uncertainty of an empirical model, so that we know what to choose among many similar candidates. The discussion is framed in the estimation theory of statistics.

Paper Details

Date Published: 23 September 2009
PDF: 8 pages
Proc. SPIE 7488, Photomask Technology 2009, 74883P (23 September 2009); doi: 10.1117/12.829731
Show Author Affiliations
Eldar Khaliullin, Luminescent Technologies, Inc. (United States)
Yaogang Lian, Luminescent Technologies, Inc. (United States)
Mark Davey, Luminescent Technologies, Inc. (United States)
Xin Zhou, Luminescent Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

© SPIE. Terms of Use
Back to Top