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Proceedings Paper

Model diagnostics-driven layout augmentation for training data
Author(s): Yue Yang; Marko Chew; Toshikazu Endo
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Proc. SPIE 7488, Photomask Technology 2009, ; doi: 10.1117/12.829719
Show Author Affiliations
Yue Yang, Mentor Graphics Corp. (United States)
Marko Chew, Mentor Graphics Corp. (United States)
Toshikazu Endo, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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