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Proceedings Paper

Adaptive OPC approach based on image simulation
Author(s): Qingwei Liu; Liguo Zhang
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Paper Abstract

With the design rule shrinks rapidly, full chip robust Optical Proximity Correction (OPC) will definitely need longer time due to the increasing pattern density. Furthermore, to achieve a perfect OPC control recipe becomes more difficult. For, the critical dimension of the design features is deeply sub exposure wavelength, and there is only limited room for the OPC correction. Usually very complicated fragment commands need to be developed to handle the shrinking designs, which can be infinitely complicated. So when you finished debug a sophisticated fragment scripts, you still cannot promise that the script is universal for all kinds of design. And when you find some hot spot after you apply OPC correction for certain design, the only thing you can do is to modify your fragmentation script and try to re-apply OPC on this design. But considering the increasing time that is needed for applying full chip OPC nowadays, re-apply OPC will definitely prolong the tape-out time. We here demonstrate an approach of adaptive OPC, with which automatic fragmentation adjustment can be realized. And this will be helpful to reduce the difficulty for OPC recipe development.

Paper Details

Date Published: 23 September 2009
PDF: 6 pages
Proc. SPIE 7488, Photomask Technology 2009, 748835 (23 September 2009); doi: 10.1117/12.829393
Show Author Affiliations
Qingwei Liu, Semiconductor Manufacturing International Corp. (China)
Liguo Zhang, Mentor Graphics Corp. (China)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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