Share Email Print
cover

Proceedings Paper

Critical dimension measurements using a 193 nm scatterfield microscope
Author(s): R. Quintanilha; Y. Sohn; B. M. Barnes; L. Howard; R. Silver
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered at a sufficiently large Conjugate Back Focal Plane (CBFP) of the microscope. A primary advance of our new scatterfield microscope is the use of 193 nm excimer laser light. Sophisticated configurations have been implemented to allow measurement of both the image plane and the Fourier plane using full-field and angleresolved illumination. Here, the microscope is primarily used in an angular mode by engineering the CBFP to enable angle-resolved scatterometer measurements with a numerical aperture (NA) range from 0.08 to 0.74. Electromagnetic models - the Finite Element Method (FEM) and the Modal Method of Fourier Expansion (MMFE) were used to model the experimental light scattering and evaluate the sensitivity to the geometrical parameters and correlations. In addition, experimental results obtained on line gratings for unpolarized illumination will be presented and discussed. measurements.

Paper Details

Date Published: 29 June 2009
PDF: 12 pages
Proc. SPIE 7390, Modeling Aspects in Optical Metrology II, 73900S (29 June 2009); doi: 10.1117/12.827679
Show Author Affiliations
R. Quintanilha, National Institute of Standards and Technology (United States)
Y. Sohn, KT Consulting Inc. (United States)
B. M. Barnes, KT Consulting Inc. (United States)
L. Howard, Precera, Inc. (United States)
R. Silver, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 7390:
Modeling Aspects in Optical Metrology II
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

© SPIE. Terms of Use
Back to Top