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Proceedings Paper

Reduced basis method for fast and robust simulation of electromagnetic scattering problems
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Paper Abstract

Numerical design inverse reconstruction and parameter estimation of optical systems usually involves the multiple solution of an e.g. geometrically parameterized system. Long computational times however can rule out many possible applications like inverse scatterometry. The reduced basis method allows to split up the solution process of an e.g. geometrically parameterized system into an expensive offline and a cheap online part. In the offline phase the reduced basis is computed selfadaptively by solving the underlying model several times. During the real-time application the reduced system is solved in the order of seconds even for 3D problems. Error estimators assure the reliability of the reduced basis solutions. In our contribution we explain general ideas of the reduced basis method and apply it to the simulation of light scattering from 2D and 3D parameterized photo masks. We compare computational times and accuracy of reduced basis and rigorous finite element simulations.

Paper Details

Date Published: 17 June 2009
PDF: 10 pages
Proc. SPIE 7390, Modeling Aspects in Optical Metrology II, 73900I (17 June 2009); doi: 10.1117/12.827588
Show Author Affiliations
Jan Pomplun, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Frank Schmidt, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)


Published in SPIE Proceedings Vol. 7390:
Modeling Aspects in Optical Metrology II
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

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