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Proceedings Paper

Stitching interferometry: the practical side of things
Author(s): Michael Bray
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Paper Abstract

Stitching Interferometry is now commonplace in Large Optics workshops. However, this technique is far more difficult to implement than might appear at first sight. More precisely, because stitching involves multiple overlapping measurements, there is huge potential for measurement error amplification. And, because there is usually no element of comparison, finding and correcting error sources is usually tricky. This has brought us to develop error detection and/or correction tools in our Stitching Software, two of which will be discussed and graphically illustrated here: First: Environment stability analysis, including computation of stitching measurements probable fluctuations. This requires no mechanical stage, and can therefore be performed as a preliminary test. Second: Calibration error is often a limiting factor. We have solved this issue, for the 1D case, using the same hardware as that used by the stitching process, and requiring no handling of the component. The 2D case is currently being developed. In this paper, we show results obtained from real measurements performed at Customers' facilities: The graphical stability outputs are very instructive, and the self-calibration technique performs remarkably well.

Paper Details

Date Published: 22 August 2009
PDF: 9 pages
Proc. SPIE 7426, Optical Manufacturing and Testing VIII, 74260Q (22 August 2009); doi: 10.1117/12.827459
Show Author Affiliations
Michael Bray, MBO-Metrology (France)


Published in SPIE Proceedings Vol. 7426:
Optical Manufacturing and Testing VIII
James H. Burge; Oliver W. Fähnle; Ray Williamson, Editor(s)

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