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Proceedings Paper

Improvements to optical performance in diffractive elements used for off-axis illumination
Author(s): Kevin Welch; Adam Fedor; Daniel Felder; John Childers; Tim Emig
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Paper Abstract

As photolithographic tools are pressed to print the ever shrinking features required in today's devices, complex off-axis illumination is taking an ever increasing role in meeting this challenge. This, in turn, is driving tighter, more stringent requirements on the diffractive elements used in these illumination systems. Specifically, any imbalance in the poles of an off-axis illuminator will contribute to reductions in the ultimate imaging performance of a lithographic tool and increased complexity in tool-to-tool matching. The article will focus on improvements to the manufacturing process that achieve substantially better pole balance. The modeling of the possible process contributors will be discussed. Challenges resulting from the manufacturing methodology will be shared. Finally, the improvement in manufacturing process performance will be reported by means of a pole balance capability index.

Paper Details

Date Published: 21 August 2009
PDF: 11 pages
Proc. SPIE 7430, Laser Beam Shaping X, 743005 (21 August 2009); doi: 10.1117/12.827396
Show Author Affiliations
Kevin Welch, Tessera North America (United States)
Adam Fedor, Tessera North America (United States)
Daniel Felder, Tessera North America (United States)
John Childers, Tessera North America (United States)
Tim Emig, Tessera North America (United States)

Published in SPIE Proceedings Vol. 7430:
Laser Beam Shaping X
Andrew Forbes; Todd E. Lizotte, Editor(s)

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