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Proceedings Paper

5000 groove/mm multilayer-coated blazed grating with 33% efficiency in the 3rd order in the EUV wavelength range
Author(s): Dmitriy L. Voronov; Erik H. Anderson; Rossana Cambie; Farhad Salmassi; Eric M. Gullikson; Valeriy V. Yashchuk; Howard A. Padmore; Minseung Ahn; Chih-Hao Chang; Ralf K. Heilmann; Mark L. Schattenburg
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Paper Abstract

We report on recent progress in developing diffraction gratings which can potentially provide extremely high spectral resolution of 105-106 in the EUV and soft x-ray photon energy ranges. Such a grating was fabricated by deposition of a multilayer on a substrate which consists of a 6-degree blazed grating with a high groove density. The fabrication of the substrate gratings was based on scanning interference lithography and anisotropic wet etch of silicon single crystals. The optimized fabrication process provided precise control of the grating periodicity, and the grating groove profile, together with very short anti-blazed facets, and near atomically smooth surface blazed facets. The blazed grating coated with 20 Mo/Si bilayers demonstrated a diffraction efficiency in the third order as high as 33% at an incidence angle of 11° and wavelength of 14.18 nm. This work was supported by the US Department of Energy under contract number DE-AC02-05CH11231.

Paper Details

Date Published: 8 September 2009
PDF: 11 pages
Proc. SPIE 7448, Advances in X-Ray/EUV Optics and Components IV, 74480J (8 September 2009); doi: 10.1117/12.826921
Show Author Affiliations
Dmitriy L. Voronov, Lawrence Berkeley National Lab. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
Rossana Cambie, Lawrence Berkeley National Lab. (United States)
Farhad Salmassi, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)
Howard A. Padmore, Lawrence Berkeley National Lab. (United States)
Minseung Ahn, Massachusetts Institute of Technology (United States)
Chih-Hao Chang, Massachusetts Institute of Technology (United States)
Ralf K. Heilmann, Massachusetts Institute of Technology (United States)
Mark L. Schattenburg, Massachusetts Institute of Technology (United States)


Published in SPIE Proceedings Vol. 7448:
Advances in X-Ray/EUV Optics and Components IV
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

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