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Proceedings Paper

Chemical vapor deposition of copper oxide films for photoelectrochemical hydrogen production
Author(s): Glenn Guglietta; Timon Wanga; Ranjan Pati; Sheryl Ehrman; Raymond A. Adomaitis
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Paper Abstract

Copper oxide films have been shown to be a promising electrode material for the direct production of hydrogen by the photoelectrochemical (PEC) decomposition of water. In this paper, we present our work in developing a hot-wall tubular CVD reactor for copper oxide film deposition using a solid-source copper precursor and oxygen. Initial deposition results have shown that the reactor can reliably deposit solid polycrystalline cuprous oxide films and porous cupric oxide films, both being promising PEC materials. Unusual spatial patters observed in the film composition prompted the development of a physically based mathematical model of the CVD process. Initial results of this modeling work and its role in understanding and optimizing the deposition process will be presented.

Paper Details

Date Published: 21 August 2009
PDF: 7 pages
Proc. SPIE 7408, Solar Hydrogen and Nanotechnology IV, 740807 (21 August 2009); doi: 10.1117/12.826711
Show Author Affiliations
Glenn Guglietta, Univ. of Maryland, College Park (United States)
Timon Wanga, Univ. of Maryland, College Park (United States)
Ranjan Pati, Univ. of Maryland, College Park (United States)
Sheryl Ehrman, Univ. of Maryland, College Park (United States)
Raymond A. Adomaitis, Univ. of Maryland, College Park (United States)


Published in SPIE Proceedings Vol. 7408:
Solar Hydrogen and Nanotechnology IV
Frank E. Osterloh, Editor(s)

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