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Proceedings Paper

Pulse electrodeposited tin sulfide films for photovoltaic applications
Author(s): Hirian B. M. Anaya; Ildefonso Z. Torres; Nini R. Mathews
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Paper Abstract

Tin sulfide (SnS) thin films of different thicknesses were deposited on TCO-coated glass substrates by pulse electrodeposition. The applied potential pulses were -0.95V (Von) and +0.1V (Voff). Crystal structure of the deposited films was orthorhombic with lattice parameters similar to that of the mineral herzenbergite. A systematic increase in the band gap value was observed with increase in the film thickness. The dark conductivities of 60 and 510 nm thick films were 3.8 x 10-8 Ω cm-1 and 6.72 x10-7 Ω cm-1 respectively. The structural parameters such as lattice constants and grain size showed a systematic change with film thickness.

Paper Details

Date Published: 21 August 2009
PDF: 7 pages
Proc. SPIE 7409, Thin Film Solar Technology, 740914 (21 August 2009); doi: 10.1117/12.826667
Show Author Affiliations
Hirian B. M. Anaya, Univ. Nacional Autónoma de México (Mexico)
Ildefonso Z. Torres, Univ. Nacional Autónoma de México (Mexico)
Nini R. Mathews, Univ. Nacional Autónoma de México (Mexico)


Published in SPIE Proceedings Vol. 7409:
Thin Film Solar Technology
Alan E. Delahoy; Louay A. Eldada, Editor(s)

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