
Proceedings Paper
Measurement of high-departure aspheric surfaces using subaperture stitching with variable null opticsFormat | Member Price | Non-Member Price |
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Paper Abstract
Aspheric surfaces can provide significant benefits to optical systems, but manufacturing high-precision
aspheric surfaces is often limited by the availability of surface metrology. Traditionally, aspheric measurements have
required dedicated null correction optics, but the cost, lead time, inflexibility, and calibration difficulty of null optics
make aspheres less attractive. In the past three years, we have developed the Subaperture Stitching Interferometer for
Aspheres (SSI-A®) to help address this limitation, providing flexible aspheric measurement capability up to 200 waves
of aspheric departure from best-fit sphere.
Some aspheres, however, have hundreds or even thousands of waves of departure. We have recently
developed Variable Optical Null (VONTM) technology that can null much of the aspheric departure in a subaperture. The
VON is automatically reconfigurable and is adjusted to nearly null each specific subaperture of an asphere. The VON
provides a significant boost in aspheric measurement capability, enabling aspheres with up to 1000 waves of departure
to be measured, without the use of null optics that are dedicated to each asphere prescription. We outline the basic
principles of subaperture stitching and the Variable Optical Null, demonstrate the extended capability provided by the
VON, and present measurement results from our new Aspheric Stitching Interferometer (ASITM).
Paper Details
Date Published: 21 August 2009
PDF: 9 pages
Proc. SPIE 7426, Optical Manufacturing and Testing VIII, 74260P (21 August 2009); doi: 10.1117/12.826544
Published in SPIE Proceedings Vol. 7426:
Optical Manufacturing and Testing VIII
James H. Burge; Oliver W. Fähnle; Ray Williamson, Editor(s)
PDF: 9 pages
Proc. SPIE 7426, Optical Manufacturing and Testing VIII, 74260P (21 August 2009); doi: 10.1117/12.826544
Show Author Affiliations
Paul Murphy, QED Technologies, Inc. (United States)
Gary DeVries, QED Technologies, Inc. (United States)
Jon Fleig, QED Technologies, Inc. (United States)
Gary DeVries, QED Technologies, Inc. (United States)
Jon Fleig, QED Technologies, Inc. (United States)
Gregory Forbes, QED Technologies, Inc. (United States)
Andrew Kulawiec, QED Technologies, Inc. (United States)
Dragisha Miladinovic, QED Technologies, Inc. (United States)
Andrew Kulawiec, QED Technologies, Inc. (United States)
Dragisha Miladinovic, QED Technologies, Inc. (United States)
Published in SPIE Proceedings Vol. 7426:
Optical Manufacturing and Testing VIII
James H. Burge; Oliver W. Fähnle; Ray Williamson, Editor(s)
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