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Proceedings Paper

Advances in full field microscopy with table-top soft x-ray lasers
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Paper Abstract

We describe recent advances in the demonstration of table-top full field microscopes that use soft x-ray lasers for illumination. We have achieved wavelength resolution and single shot exposure operation with a very compact 46.9 nm microscope based on a desk-top size capillary discharge laser. This λ=46.9 nm microscope has been used to captured full field images of a variety of nanostructure systems and surfaces. In a separate development we have demonstrated a zone plate microscope that uses λ=13.2 nm laser illumination to image absorption defects in a extreme ultraviolet lithography (EUVL) mask in the same geometry used in a 4x demagnification EUVL stepper. Characterization of the microscope's transfer function shows it can resolve 55 nm half period patterns. With these capabilities, the λ=13.2 nm microscope is well suited for evaluation of pattern and defect printability of EUVL masks for the 22 nm node.

Paper Details

Date Published: 28 September 2009
PDF: 8 pages
Proc. SPIE 7451, Soft X-Ray Lasers and Applications VIII, 74510I (28 September 2009); doi: 10.1117/12.826419
Show Author Affiliations
Carmen S. Menoni, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Fernando Brizuela, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Yong Wang, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Courtney A. Brewer, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Bradley M. Luther, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Francesco Pedaci, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Przemeslaw W. Wachulak, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Mario C. Marconi, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Jorge J. Rocca, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Weilun Chao, Lawrence Berkeley National Lab. (United States)
NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Yanwei Liu, Lawrence Berkeley National Lab. (United States)
NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
David T. Attwood, NSF Engineering Reseach Ctr, for Extreme Ultraviolet Science and Technology, Colorado State Univ. (United States)
Lawrence Berkeley National Lab. (United States)
Univ. of California, Berkeley (United States)
Alexander V. Vinogradov, P.N. Lebedev Physical Institute (Russian Federation)
Igor A. Artyukov, P.N. Lebedev Physical Institute (Russian Federation)
Yuri P. Pershyn, National Technical Univ. (Ukraine)
Viktor Kondratenko, National Technical Univ. (Ukraine)


Published in SPIE Proceedings Vol. 7451:
Soft X-Ray Lasers and Applications VIII
James Dunn; Gregory J. Tallents, Editor(s)

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