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Proceedings Paper

Improved efficiency of materials processing by dual action of XUV/Vis-NIR ultrashort laser pulses and comprehensive study of high-order harmonic source at PALS
Author(s): Krzysztof Jakubczak; Tomas Mocek; Bedrich Rus; Jan Hrebicek; Magdalena Sawicka; I Jong Kim; Seung Beom Park; Tae Keun Kim; Gye Hwang Lee; Chang Hee Nam; Jaromir Chalupsky; Vera Hajkova; Libor Juha; Jaroslav Sobota; Tomas Fort
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Paper Abstract

We demonstrate a novel experimental method for improvement of efficiency of structural surface modification of various solids (PMMA, amorphous carbon) achieved by simultaneous action of XUV (21.6 nm), obtained from high-order harmonic generation (HHG), and VIS-NIR (410/820 nm) laser pulses. Although the fluence of each individual pulse was far below the surface ablation threshold, very efficient and specific material modification was observed after irradiation by a single or a few shots of mixed XUV/VIS-NIR radiation. We also report results on comprehensive characterization of ultrafast coherent X-ray beamline at Prague Asterix Laser System (PALS). The beamline is based on 1 kHz, table-top, high-order harmonic generation source capable to deliver fully coherent beam in the 30 nm spectral range. Ti:sapphire (810 nm, 1 kHz) laser pulses with a duration of 35 fs and energy 1.2 mJ have been focused into gas cell containing conversion medium (Ar). To achieve highly efficient HHG we will apply the technique of guided laser pulses. Source parameters were investigated.

Paper Details

Date Published: 4 September 2009
PDF: 9 pages
Proc. SPIE 7448, Advances in X-Ray/EUV Optics and Components IV, 744806 (4 September 2009); doi: 10.1117/12.826404
Show Author Affiliations
Krzysztof Jakubczak, Institute of Physics (Czech Republic)
Tomas Mocek, Institute of Physics (Czech Republic)
Bedrich Rus, Institute of Physics (Czech Republic)
Jan Hrebicek, Institute of Physics (Czech Republic)
Magdalena Sawicka, Institute of Physics (Czech Republic)
I Jong Kim, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Seung Beom Park, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Tae Keun Kim, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Gye Hwang Lee, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Chang Hee Nam, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Jaromir Chalupsky, Institute of Physics (Czech Republic)
Vera Hajkova, Institute of Physics (Czech Republic)
Libor Juha, Institute of Physics (Czech Republic)
Jaroslav Sobota, Institute of Scientific Instruments (Czech Republic)
Tomas Fort, Institute of Scientific Instruments (Czech Republic)


Published in SPIE Proceedings Vol. 7448:
Advances in X-Ray/EUV Optics and Components IV
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

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