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Proceedings Paper

Nanometer level freeform surface measurements with the NANOMEFOS non-contact measurement machine
Author(s): Rens Henselmans; Lennino Cacace; Geerten Kramer; Nick Rosielle; Maarten Steinbuch
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Paper Abstract

Applying aspherical and freeform optics in high-end optical systems can improve system performance while decreasing the system mass, size and number of required components. The NANOMEFOS measurement machine is capable of universal non-contact and fast measurement of aspherical and freeform optics up to ∅500 mm, with an uncertainty of 30 nm (2σ). In this machine, the surface is placed on a continuously rotating air bearing spindle, while a specially developed optical probe is positioned over it by a motion system. A separate metrology system measures the probe and product position relative to a metrology frame. The prototype realization, including custom electronics and software, has been completed. The noise level at standstill is 0.88 nm rms. A reference flat was measured with 13 μm and 0.73 mm tilt. Both measurements show an rms flatness of about 8 nm rms, which correspond to the NMi measurement. A hemisphere has also been measured up to 50° slope, and placed 0.2 mm eccentric on the spindle. These measurements reproduce to about 5 nm rms. Calibration and software are currently being improved and the machine is applied in TNO aspherical and freeform optics production.

Paper Details

Date Published: 21 August 2009
PDF: 11 pages
Proc. SPIE 7426, Optical Manufacturing and Testing VIII, 742606 (21 August 2009); doi: 10.1117/12.826067
Show Author Affiliations
Rens Henselmans, TNO Science and Industry (Netherlands)
Lennino Cacace, AC Optomechanix (Netherlands)
Technische Univ. Eindhoven (Netherlands)
Geerten Kramer, TNO Science and Industry (Netherlands)
Nick Rosielle, Technische Univ. Eindhoven (Netherlands)
Maarten Steinbuch, Technische Univ. Eindhoven (Netherlands)

Published in SPIE Proceedings Vol. 7426:
Optical Manufacturing and Testing VIII
James H. Burge; Oliver W. Fähnle; Ray Williamson, Editor(s)

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