Share Email Print
cover

Proceedings Paper

The absorption modes of a dielectric-metal-dielectric nanorod array in the Kretschmann configuration
Author(s): Yi-Jun Jen; Chia-Feng Lin; Tzu-Yi Chan
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The glancing angle deposition (GLAD) technique is applied to fabricate a three-layered dielectric-metal-dielectric anisotropic thin film. The silver nanorod array is between two SiO2 nanorod arrays (NRA). The three-layered thin film is arranged in the Kretschmann configuration and measured the reflectance of the system. The polarization conversion reflectance is measured from this system as the plane of incidence is not coincident with the deposition plane. From the angular spectra of reflectance for RPP, RSS, RSP and RPS (Rij, i denotes the polarization of the incident beam and j denotes the polarization of the reflected light) measured at angles larger than critical angle, the absorption for s-polarization and p-polarization incident light can be calculated. The resonant peaks varied with the orientation of the deposition plane are also measured. The configuration combines polarization conversion, transverse surface plasmon resonance and longitudinal surface plasmon resonance of the rods. Those resonances are associated with the relationship between the rod directions and the oscillating electric field vector. The variations of the absorption peaks affected by those resonant modes are discussed in this work.

Paper Details

Date Published: 3 September 2009
PDF: 8 pages
Proc. SPIE 7394, Plasmonics: Metallic Nanostructures and Their Optical Properties VII, 73942I (3 September 2009); doi: 10.1117/12.825938
Show Author Affiliations
Yi-Jun Jen, National Taipei Univ. of Technology (Taiwan)
Chia-Feng Lin, National Taipei Univ. of Technology (Taiwan)
Tzu-Yi Chan, National Taipei Univ. of Technology (Taiwan)


Published in SPIE Proceedings Vol. 7394:
Plasmonics: Metallic Nanostructures and Their Optical Properties VII
Mark I. Stockman, Editor(s)

© SPIE. Terms of Use
Back to Top