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Proceedings Paper

High temperature XRD of zirconia/alumina multilayer thin films prepared by pulsed laser deposition
Author(s): G. Balakrishnan; S. Murugesan; C. Ghosh; P. Kuppusami; R. Divakar; E. Mohandas; D. Sastikumar
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Paper Abstract

Al2O3/ZrO2 multilayers have been deposited on Si(100) substrates by reactive pulsed laser deposition technique. The experiments were performed at an optimized oxygen partial pressure of 3x10-2 mbar at room temperature. A nanolaminate structure consisting of alternate layers of ZrO2 and Al2O3 with 40 bi-layers were fabricated with thickness of each layer of zirconia and alumina of 15 nm and 5 nm, respectively. The cross-sectional transmission electron microscope (XTEM) investigations were carried out on a multilayer thin film deposited at room temperature. The XTEM study shows the formation of uniform thickness, higher fraction of monoclinic and small fraction of tetragonal phases of zirconia and amorphous alumina. The ZrO2 /Al2O3 multilayer film was characterized using high temperature x-ray diffraction (HTXRD) in the temperature range RT-1473 K. The ZrO2 /Al2O3 multilayer shows a crystallization temperature of 673 K for the formation of tetragonal and monoclinic phases with significant amount of tetragonal phase over the latter. From the HTXRD profiles, crystallite size, lattice parameters, and thermal expansion coefficient of the tetragonal phase were calculated.

Paper Details

Date Published: 20 August 2009
PDF: 10 pages
Proc. SPIE 7404, Nanostructured Thin Films II, 74040P (20 August 2009); doi: 10.1117/12.825890
Show Author Affiliations
G. Balakrishnan, National Institute of Technology, Tiruchirappalli (India)
S. Murugesan, Indira Gandhi Ctr. for Atomic Research (India)
C. Ghosh, Indira Gandhi Ctr. for Atomic Research (India)
P. Kuppusami, Indira Gandhi Ctr. for Atomic Research (India)
R. Divakar, Indira Gandhi Ctr. for Atomic Research (India)
E. Mohandas, Indira Gandhi Ctr. for Atomic Research (India)
D. Sastikumar, National Institute of Technology, Tiruchirappalli (India)


Published in SPIE Proceedings Vol. 7404:
Nanostructured Thin Films II
Geoffrey B. Smith; Akhlesh Lakhtakia; Cheng-Chung Lee, Editor(s)

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