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Proceedings Paper

Space environment experiments of SiC/Mg multilayer for astronomical observation
Author(s): Jingtao Zhu; Haochuan Li; Liang Bai; Qiushi Huang; Moyan Tan; Li Jiang; Zhong Zhang; Lei Li; Hunjun Zhou; Tonglin Huo; Xiaoqiang Wang; Jing Xu; Zhanshan Wang; Lingyan Chen
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Paper Abstract

SiC/Mg, Mo/Si and SiC/Si period multilayer mirrors were developed for solar He-II radiation at 30.4 nm. The optical stabilities of the SiC/Mg multilayer were investigated before and after space environment simulation tests for the purpose of potential application in space extreme ultraviolet observation. The multilayers are deposited by using direct current magnetron sputtering method in Ar gas atmosphere on polished fused silica substrate. Then, the reflectivities were measured at synchrotron radiation. The SiC/Mg multilayer provides the highest reflectivity of 34.0%, only 18.6% and 13.9% for Mo/Si and SiC/Si multilayer mirrors. However, Mg is known to be highly reactive and low melting point. Therefore, the thermal cycling stability test and radiation exposure experiments were performed for SiC/Mg multilayer to simulate the space environment, respectively. The testing results indicate that the reflectivity of SiC/Mg multilayer decreases slightly. After thermal cycling from -45 to 145 Celsius degree three times, the reflectivity decrease from 34.0% to 31.0%. After gamma radiation exposure, the reflectivity decreases from 31.4% to 29.4%.

Paper Details

Date Published: 31 August 2009
PDF: 6 pages
Proc. SPIE 7437, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV, 74371S (31 August 2009); doi: 10.1117/12.825764
Show Author Affiliations
Jingtao Zhu, Tongji Univ. (China)
Haochuan Li, Tongji Univ. (China)
Liang Bai, Tongji Univ. (China)
Qiushi Huang, Tongji Univ. (China)
Moyan Tan, Tongji Univ. (China)
Li Jiang, Tongji Univ. (China)
Zhong Zhang, Tongji Univ. (China)
Lei Li, Ctr. for Space Science and Applied Research (China)
Hunjun Zhou, Univ. of Science and Technology of China (China)
Tonglin Huo, Univ. of Science and Technology of China (China)
Xiaoqiang Wang, Tongji Univ. (China)
Jing Xu, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)
Lingyan Chen, Tongji Univ. (China)

Published in SPIE Proceedings Vol. 7437:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV
Stephen L. O'Dell; Giovanni Pareschi, Editor(s)

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