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Proceedings Paper

Application of He ion microscopy for material analysis
Author(s): F. Altmann; M. Simon; R. Klengel
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Paper Abstract

Helium ion beam microscopy (HIM) is a new high resolution imaging technique. The use of Helium ions instead of electrons enables none destructive imaging combined with contrasts quite similar to that from Gallium ion beam imaging. The use of very low probe currents and the comfortable charge compensation using low energy electrons offer imaging of none conductive samples without conductive coating. An ongoing microelectronic sample with Gold/Aluminum interconnects and polymer electronic devices were chosen to evaluate HIM in comparison to scanning electron microscopy (SEM). The aim was to look for key applications of HIM in material analysis. Main focus was on complementary contrast mechanisms and imaging of none conductive samples.

Paper Details

Date Published: 22 May 2009
PDF: 6 pages
Proc. SPIE 7378, Scanning Microscopy 2009, 73780C (22 May 2009); doi: 10.1117/12.825735
Show Author Affiliations
F. Altmann, Fraunhofer Institute for Mechanics of Materials (Germany)
M. Simon, Fraunhofer Institute for Mechanics of Materials (Germany)
R. Klengel, Fraunhofer Institute for Mechanics of Materials (Germany)


Published in SPIE Proceedings Vol. 7378:
Scanning Microscopy 2009
Michael T. Postek; Michael T. Postek; Michael T. Postek; Dale E. Newbury; Dale E. Newbury; Dale E. Newbury; S. Frank Platek; S. Frank Platek; S. Frank Platek; David C. Joy; David C. Joy; David C. Joy, Editor(s)

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