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Proceedings Paper

Use of multiple DC magnetron deposition sources for uniform coating of large areas
Author(s): David W. Reicher; Roberto Christian; Patrick Davidson; Stanley Z. Peplinski
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Paper Abstract

Uniform coating of large areas is a technically challenging aspect of physical vapor deposition. This investigation shows that good film uniformity across large areas can be repetitively achieved by a DC magnetron sputtering process by use of multiple sources. A unique feature of this technique is the ability to predict and control the film distribution using the deposition rate, adding flexibility to the deposition system. A model for predicting the material distribution from multiple sources is presented. It will also be demonstrated that this process yields efficient use of the vapor generated from the sources, which results in higher deposition rates and less system maintenance.

Paper Details

Date Published: 21 August 2009
PDF: 11 pages
Proc. SPIE 7409, Thin Film Solar Technology, 740909 (21 August 2009); doi: 10.1117/12.824882
Show Author Affiliations
David W. Reicher, S.Systems Corp. (United States)
Roberto Christian, S.Systems Corp. (United States)
Patrick Davidson, S.Systems Corp. (United States)
Stanley Z. Peplinski, Airforce Research Lab. (United States)


Published in SPIE Proceedings Vol. 7409:
Thin Film Solar Technology
Alan E. Delahoy; Louay A. Eldada, Editor(s)

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