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Proceedings Paper

Fabrication of 300-mm silicon reference wafer by using direct laser writer
Author(s): Hyug-Gyo Rhee; Dong-Ik Kim; Seung-Ki Hong; Jae-Bong Song; Yun-Woo Lee
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Paper Abstract

We propose a new method based on direct laser writing to fabricate reference chromium patterns on a silicon wafer. Our method is able to fabricate a maximum 360-mm-diameter pattern with 651-nm position uncertainty. The minimum pattern size is about 0.8 μm (line width value) and the maximum available height of the pattern is slightly over 400 nm.

Paper Details

Date Published: 21 August 2009
PDF: 4 pages
Proc. SPIE 7426, Optical Manufacturing and Testing VIII, 742612 (21 August 2009); doi: 10.1117/12.824846
Show Author Affiliations
Hyug-Gyo Rhee, Korea Research Institute of Standards and Science (Korea, Republic of)
Dong-Ik Kim, Korea Basic Science Institute (Korea, Republic of)
Seung-Ki Hong, Korea Research Institute of Standards and Science (Korea, Republic of)
Jae-Bong Song, Korea Research Institute of Standards and Science (Korea, Republic of)
Yun-Woo Lee, Korea Research Institute of Standards and Science (Korea, Republic of)


Published in SPIE Proceedings Vol. 7426:
Optical Manufacturing and Testing VIII
James H. Burge; Oliver W. Fähnle; Ray Williamson, Editor(s)

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