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Proceedings Paper

Recent progress in understanding the imaging and metrology using the helium ion microscope
Author(s): Michael T. Postek; Andras E. Vladar; Bin Ming
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Paper Abstract

Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of these barriers. A new tool for imaging and metrology for nanotechnology is the scanning Helium Ion Microscope (HIM). The HIM is a new approach to imaging and metrology for nanotechnology which may be able to push this barrier lower. As a new methodology, it is just beginning to show promise and the number of potentially advantageous applications for nanotechnology and nanometrology has yet to be fully exploited. This presentation will discuss some of the progress made at NIST in collaboration with the manufacturing community in understanding the imaging and metrology for this new technology.

Paper Details

Date Published: 22 May 2009
PDF: 10 pages
Proc. SPIE 7378, Scanning Microscopy 2009, 737808 (22 May 2009); doi: 10.1117/12.824533
Show Author Affiliations
Michael T. Postek, National Institute of Standards and Technology (United States)
Andras E. Vladar, National Institute of Standards and Technology (United States)
Bin Ming, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 7378:
Scanning Microscopy 2009
Michael T. Postek; Michael T. Postek; Michael T. Postek; Dale E. Newbury; Dale E. Newbury; Dale E. Newbury; S. Frank Platek; S. Frank Platek; S. Frank Platek; David C. Joy; David C. Joy; David C. Joy, Editor(s)

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