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Proceedings Paper

Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics
Author(s): Juequan Chen; Eric Louis; Fred Bijkerk; Chris J. Lee; Herbert Wormeester; Reinhard Kunze; Hagen Schmidt; Dieter Schneider; Roel Moors; Willem van Schaik; Monika Lubomska
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Paper Abstract

Carbon contamination layers, deposited on extreme ultraviolet (EUV) multilayer mirrors during illumination were characterized ex situ using spectroscopic ellipsometry (SE), laser generated surface acoustic waves (LG-SAW), and by their EUV reflectance loss. We show SE is more sensitive to the deposition of carbon layers than the EUV reflectance loss, even in the presence of the highly heterogeneous structure of the multilayer. SE has better overall sensitivity, with a detection limit of 0.2 nm, while LG-SAW has an approximate detection limit < 5 nm.

Paper Details

Date Published: 18 March 2009
PDF: 6 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 727140 (18 March 2009); doi: 10.1117/12.824435
Show Author Affiliations
Juequan Chen, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Eric Louis, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Fred Bijkerk, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Univ. Twente (Netherlands)
Chris J. Lee, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Univ. Twente (Netherlands)
Herbert Wormeester, Univ. Twente (Netherlands)
Reinhard Kunze, Leibniz Institute for Solid State and Materials Research (Germany)
Hagen Schmidt, Leibniz Institute for Solid State and Materials Research (Germany)
Dieter Schneider, Fraunhofer Institute for Material and Beam Technology (Germany)
Roel Moors, ASML B.V. (Netherlands)
Willem van Schaik, ASML B.V. (Netherlands)
Monika Lubomska, ASML B.V. (Netherlands)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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