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Proceedings Paper

Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV
Author(s): Tim Tsarfati; Erwin Zoethout; Eric Louis; Robbert van de Kruijs; Andrey Yakshin; Stephan Müllender; Fred Bijkerk
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Paper Abstract

We present a computational and experimental study on interface passivation of B4C/La multilayers for photolithography at wavelengths beyond 13.5 nm. We successfully applied N-plasma treatment to form interface-localized BN and LaN layers, preventing LaB6 and LaC2 interlayer formation and increasing the optical contrast. Experiments suggest an improvement of absolute reflection by up to 20% for 200 period multilayers, with a best-so-far result of 41.5 % at near-normal incidence of 6.7 nm.

Paper Details

Date Published: 18 March 2009
PDF: 8 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72713V (18 March 2009); doi: 10.1117/12.824434
Show Author Affiliations
Tim Tsarfati, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Erwin Zoethout, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Eric Louis, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Robbert van de Kruijs, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Andrey Yakshin, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Stephan Müllender, Carl Zeiss SMT AG (Germany)
Fred Bijkerk, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
Univ. of Twente (Netherlands)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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