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Proceedings Paper

Study of the pattern categorization method in verification of OPC pattern
Author(s): Mitsufumi Naoe; Toru Miyauchi; Seiji Makino; Koichi Suzuki; Masakazu Oseki; Tomoyuki Okada
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Paper Abstract

Owing to reduction of LSI device pattern, verification of mask pattern after optical proximity correction, OPC, by using Litho-Simulation becomes common practice. The verification using Litho-Simulation does not only increase reliability, but also the verification time. To solve this problem, we extract error patterns and categorize them, and we review only the representative pattern of each category to save time. But further reduction of device pattern might increase the verification time. There is loose matching method to save the time, but it has a week point such that accuracy of categorization is trade-off with error pattern number to be reviewed. We tried a method of categorization referring to original pattern, CROP. The CROP method categorizes error patterns referring to original pattern extracted by the position data of the error pattern. For this reason, categorization of error patterns is accurate, and the number category of a product pattern is reduced to1/50 compared with pattern matching method, which is loose matching method with 0 nm matching size.

Paper Details

Date Published: 11 May 2009
PDF: 7 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737933 (11 May 2009); doi: 10.1117/12.824353
Show Author Affiliations
Mitsufumi Naoe, Fujitsu VLSI Ltd. (Japan)
Toru Miyauchi, Fujitsu VLSI Ltd. (Japan)
Seiji Makino, Fujitsu Microelectronics Ltd. (Japan)
Koichi Suzuki, Fujitsu Microelectronics Ltd. (Japan)
Masakazu Oseki, Fujitsu Microelectronics Ltd. (Japan)
Tomoyuki Okada, Fujitsu Microelectronics Ltd. (Japan)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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