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Proceedings Paper

Utilization of design intent information for mask manufacturing (II)
Author(s): Kokoro Kato; Masakazu Endo; Tadao Inoue; Masaki Yamabe
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Paper Abstract

The problem of mask cost has been highlighted recently due to the complex manufacturing process as the semiconductor node is getting smaller and smaller. It has been said that DFM methods can be useful for mask cost reduction. One of the ASET/Mask D2I target is the mask data prioritization and its effective uses for mask manufacturing issues from the viewpoints of mask DFM. The Mask D2I and STARC have been working together to build efficient data flow based on the information transition from the design to the manufacturing level. By converting design level information called as "Design Intent" to the priority information of mask manufacturing data called as "Mask Data Rank (MDR)", MDP or manufacturing process based on the importance of reticle patterns is possible. Our main purpose is to build a novel data flow with the priority information of mask patterns extracted from the design intent. In this paper, we introduce a design intent extraction flow which has been newly developed and we show the effectiveness of the fully automated MDR flow with actual chip data. In addition, we show how MDR flow can be applied to analog circuits.

Paper Details

Date Published: 11 May 2009
PDF: 9 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737932 (11 May 2009); doi: 10.1117/12.824352
Show Author Affiliations
Kokoro Kato, Association of Super-Advanced Electronics Technologies (Japan)
Masakazu Endo, Association of Super-Advanced Electronics Technologies (Japan)
Tadao Inoue, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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