Share Email Print
cover

Proceedings Paper

Evaluation of mask data format standard OASIS.MASK developed for mask tools
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We have evaluated a unified mask pattern data format named "OASIS.MASK"1 and a unified job deck format named "MALY"2 for mask tools as the input data formats of the inspection tool using the mask data and the photomask produced with the 65nm design rule. The data conversion time and the data volume for the inspection data files were evaluated by comparing with the results for using the native EB data and the native job deck data. The inspection speed and the defect number of the inspection tool were also evaluated with the actual inspection tool. We have confirmed that there is no large issue in applying OASIS.MASK and MALY to the input data formats of the inspection tool and they can become the common intermediate format in our MDP flow. The detail of evaluation results will be mainly introduced in this paper.

Paper Details

Date Published: 11 May 2009
PDF: 9 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737931 (11 May 2009); doi: 10.1117/12.824351
Show Author Affiliations
Toshio Suzuki, Dai Nippon Printing Co., Ltd. (Japan)
Yoshinori Nagaoka, KLA-Tencor Corp. (United States)
Yumiko Maenaka, KLA-Tencor Corp. (United States)
Venu Vellanki, KLA-Tencor Japan Ltd. (Japan)
Wayne Ruch, KLA-Tencor Japan Ltd. (Japan)
Masayoshi Mori, Renesas Technology Corp. (Japan)
Keiko Hattori, Renesas Technology Corp. (Japan)
Kunihiro Hosono, Renesas Technology Corp. (Japan)
Shogo Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

© SPIE. Terms of Use
Back to Top