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Proceedings Paper

Fully integrated mask-to-wafer computational lithography techniques for 32nm to 22nm nodes
Author(s): Vishnu G. Kamat; Apo Sezginer; Bayram Yenikaya; Jesus Carrero; Tamer H. Coskun; Oleg Alexandrov; Constantin Chuyeshov
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Paper Details

Date Published:
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Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73792X; doi: 10.1117/12.824347
Show Author Affiliations
Vishnu G. Kamat, Cadence Design Systems, Inc. (United States)
Apo Sezginer, Cadence Design Systems, Inc. (United States)
Bayram Yenikaya, Cadence Design Systems, Inc. (United States)
Jesus Carrero, Cadence Design Systems, Inc. (United States)
Tamer H. Coskun, Cadence Design Systems, Inc. (United States)
Oleg Alexandrov, Cadence Design Systems, Inc. (United States)
Constantin Chuyeshov, Cadence Design Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI

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