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Proceedings Paper

Actinic mask inspection using an extreme ultraviolet microscope
Author(s): Kei Takase; Yoshito Kamaji; Takafumi Iguchi; Takashi Sugiyama; Toshiyuki Uno; Tetsuo Harada; Takeo Watanabe; Hiroo Kinoshita
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Paper Abstract

We constructed an extreme ultraviolet microscope (EUVM) system for actinic mask inspection that consists of Schwarzschild optics and an X-ray zooming tube. This system was used to inspect finished extreme ultraviolet lithography (EUVL) masks and Mo/Si coated substrates of ULE glass. And we have fabricated programmed phase defects on the blanks used for inspection. The EUVM was able to resolve a programmed line-pit defect with a width of 40 nm and a depth of 10 nm, and also with a width of 70 nm and a depth of 2.0 nm. However, a 75-nm-wide 1.5-nm-deep pit defect was not resolved. Also, the EUVM was able to resolve a programmed hole-pit defects with widths ranging from 35 nm to 170 nm and depths ranging from 2.5 nm to 2.2 nm. However, 20-nm-wide 1.5-nm-deep hole-pit defects were not resolved. These results agree with the simulation results perfectly. Thus, in this study, one critical dimension of a pit defects was experimentaly estimated to be a width of 20 nm and a depth of 2.0 nm.

Paper Details

Date Published: 11 May 2009
PDF: 8 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73792J (11 May 2009); doi: 10.1117/12.824333
Show Author Affiliations
Kei Takase, Univ. of Hyogo (Japan)
Yoshito Kamaji, Univ. of Hyogo (Japan)
Takafumi Iguchi, Univ. of Hyogo (Japan)
Takashi Sugiyama, Asahi Glass Co., Ltd. (Japan)
Toshiyuki Uno, Asahi Glass Co., Ltd. (Japan)
Tetsuo Harada, Univ. of Hyogo (Japan)
Takeo Watanabe, Univ. of Hyogo (Japan)
Hiroo Kinoshita, Univ. of Hyogo (Japan)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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