Share Email Print

Proceedings Paper

Semi-automated repair verification of aerial images
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Using aerial image metrology to qualify repairs of defects on photomasks is an industry standard. Aerial image metrology provides reasonable matching of lithographic imaging performance without the need for wafer prints. Utilization of this capability by photomask manufacturers has risen due to the increased complexity of layouts incorporating RET and phase shift technologies. Tighter specifications by end-users have pushed aerial image metrology activities to now include CD performance results in addition to the traditional intensity performance results. Discussed is the computer implemented semi-automated analysis of aerial images for repair verification activities. Newly designed user interfaces and algorithms could guide users through predefined analysis routines as to minimize errors. There are two main routines discussed here, one allowing multiple reference sites along with a test/defect site on a single image of repeating features. The second routine compares a test/defect measurement image with a reference measurement image. This paper highlights new functionality desirable for aerial image analysis as well as describes possible ways of its realization. Using structured analysis processes and innovative analysis tools could lead to a highly efficient and more reliable result reporting of repair verification metrology.

Paper Details

Date Published: 11 May 2009
PDF: 7 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73792D (11 May 2009); doi: 10.1117/12.824327
Show Author Affiliations
Eric Poortinga, Carl Zeiss SMT Inc. (United States)
Thomas Schereubl, Carl Zeiss SMS GmbH (Germany)
Rigo Richter, Carl Zeiss SMS GmbH (Germany)

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

© SPIE. Terms of Use
Back to Top