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Proceedings Paper

Variable sensitivity detection (VSD) technology for screening SRAF nuisance defects
Author(s): Kyoji Yamashita; Nobuyuki Harabe; Masatoshi Hirono; Yukio Tamura; Ikunao Isomura; Yoshitake Tsuji; Eiji Matsumoto
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Paper Abstract

This paper describes a novel technology Variable Sensitivity Detection (VSD) for de-sensing SRAF nuisance defects in a mask inspection system. The point of our approach is to search the nearest thin-line to each defect candidate and estimate the line-width with transmitted and reflected images. The dependence of transmitted and reflected image contract on line-width is calculated with a rigorous model. This technology de-senses lineend shortening and edge roughness of SRAF patterns without compromising sensitivity to main features. Total counts of SRAF nuisance detection were drastically reduced. The VSD technology was implemented to a platform of Nuflare NPI-5000PLUS.

Paper Details

Date Published: 11 May 2009
PDF: 8 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737929 (11 May 2009); doi: 10.1117/12.824323
Show Author Affiliations
Kyoji Yamashita, Advanced Mask Inspection Technology, Inc. (Japan)
Nobuyuki Harabe, Advanced Mask Inspection Technology, Inc. (Japan)
Masatoshi Hirono, Advanced Mask Inspection Technology, Inc. (Japan)
Yukio Tamura, Advanced Mask Inspection Technology, Inc. (Japan)
Ikunao Isomura, Advanced Mask Inspection Technology, Inc. (Japan)
Yoshitake Tsuji, Advanced Mask Inspection Technology, Inc. (Japan)
Eiji Matsumoto, NuFlare Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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