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Proceedings Paper

A new optical measurement method for verifying the exact change of thin films on the QZ blanks with ellipsometer
Author(s): Songbae Moon; Seong-Yoon Kim; Gyung-Yoon Bang; Byung-Gook Kim; Sang-Gyun Woo; Han-ku Cho
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Paper Abstract

The information of the chromium top layer is important in photomask fabrication. Resist coating process and optical transmittance change of chromium after mask cleaning process depend on the surface morphology and thickness. In this paper, we present that ellipsometry, the nondestructive optical measurement method, is an effective and convenient method for the inspection of chromium oxide on the quartz blank. We checked data obtained by ellipsometry for chromium surface morphology with atomic force microscope, for surface energy with contact angle measurement, and for optical density change with optical transmittance measurement. It turns out that ellipsometry gives successfully the information of chromium oxide on the quartz blank.

Paper Details

Date Published: 11 May 2009
PDF: 6 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737913 (11 May 2009); doi: 10.1117/12.824315
Show Author Affiliations
Songbae Moon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seong-Yoon Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Gyung-Yoon Bang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Byung-Gook Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sang-Gyun Woo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Han-ku Cho, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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