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Proceedings Paper

Selective removal of persistent particles with no photomask damage
Author(s): Tod Robinson; Ron Bozak; Roy White; Mike Archuletta; David Lee
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Paper Abstract

Makers and users of advanced technology photomasks have seen increased difficulties with the removal of persistent, or stubborn, nano-particle contamination. Shrinking pattern geometries, and new mask clean technologies to minimize haze, have both increased the number of problems and loss of mask yield due to these non-removable nano-particles. A novel technique (BitCleanTM) has been developed using a scanning probe microscope system originally designed for nanomachining photomask defect repair. Progress in the technical development of this approach into a manufacture-able solution is reviewed and its effectiveness is shown in selectively removing adherent particles without touching surrounding sensitive structures. Methods for generating targeted edge test particles along with considerations for removal of particles in various pattern geometries and materials are also discussed.

Paper Details

Date Published: 11 May 2009
PDF: 7 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73791J (11 May 2009); doi: 10.1117/12.824296
Show Author Affiliations
Tod Robinson, RAVE, LLC (United States)
Ron Bozak, RAVE, LLC (United States)
Roy White, RAVE, LLC (United States)
Mike Archuletta, RAVE, LLC (United States)
David Lee, RAVE, LLC (United States)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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