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Proceedings Paper

Present status of multi-column cell exposure system for mask writing
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Paper Abstract

In the Mask D2I project at ASET, we are developing a novel electron beam exposure system using the concepts of MCC (multi column cell), CP (character projection), and VSB (variable shaped beam) to improve the throughput of electron beam exposure systems. In this paper we present the outline of a proof-of-concept system of MCC, results of the evaluation of fundamental functions of the system, and early writing results including multi column stitching. In the evaluation of fundamental functions of the system, we found that there is no interference on beam positions among the CCs, and that the beam position stability is quite good. In our early writing experiments, we had presented the first writing result of MCC and the first stitching result of a multi column system ever reported.

Paper Details

Date Published: 11 May 2009
PDF: 7 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737918 (11 May 2009); doi: 10.1117/12.824285
Show Author Affiliations
Hiroshi Yasuda, Association of Super-Advanced Electronics Technologies (Japan)
Akio Yamada, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI

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