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Proceedings Paper

GPU-accelerated inverse lithography technique
Author(s): Jinyu Zhang; Yangdong Deng; Wei Xiong; Yao Peng; Zhiping Yu
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Paper Abstract

The aim of this paper is to explore the use of the Graphic Processing Unit (GPU) for mask design using inverse lithography technique (ILT). We extend a newly proposed ILT algorithm called cost-function-reduction method (CFRM) to general partial-coherence image systems. To release heavy computational cost in this algorithm such as intensity computation, the algorithm is modified for GPU implementation. The scalability of the GPU implementation is demonstrated using different sizes of matrix in incoherence image system and partial-coherence image system. The total GPU optimization time for a 25μm×25μm mask in partial-coherence image model is about 8.2 second. About 15X performance increase have been achieved than that of an algorithm solely implemented on a high-end CPU. The maximum mask size is limited by GPU card memory.

Paper Details

Date Published: 11 May 2009
PDF: 11 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790Z (11 May 2009); doi: 10.1117/12.824276
Show Author Affiliations
Jinyu Zhang, Tsinghua Univ. (China)
Yangdong Deng, Tsinghua Univ. (China)
Wei Xiong, Tsinghua Univ. (China)
Yao Peng, Tsinghua Univ. (China)
Zhiping Yu, Tsinghua Univ. (China)

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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