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Proceedings Paper

European MEDEA+ CRYSTAL project: DFM photomasks inputs for EDA workflow task force
Author(s): Eric Beisser; Michel Tissier; David Au; Stéphane Bonniol; Patrick Garcia; Philippe Morey-Chaisemartin; Dominique Sadran; Isabelle Servin; Michel Tabusse
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Paper Abstract

The cost of production of a photomask set has been soaring over the last few years, and now reaches $1 million to $2 million, almost 10% of the overall cost of a new project development. And new projects have seen their profitability lifetime reduced over time to 3 to 6 months. Any uncontrolled increase in cost or delay can make the difference between a profitable or non profitable project, and can even lead to the cancellation of the entire project. For the last few years, silicon manufacturability issues have been taken into account in the design process through a widespread use of Design For Manufacturing tools, but so far the impact of design on mask manufacturability has not been thoroughly studied. This article presents a novel Design For Mask Manufacturing approach, which defines a robust process encompassing design rules and constraints, validation procedures, exchange mechanisms between all actors in the flow (designers, mask shops, and foundry) in order to minimize the number and impact of mask design issues, to trace their root causes and severity, and automation of the handoff of design and administrative data to the mask shop. A demonstrator for the DFMM flow is being shown.

Paper Details

Date Published: 11 May 2009
PDF: 9 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790W (11 May 2009); doi: 10.1117/12.824273
Show Author Affiliations
Eric Beisser, XYALIS sarl (France)
Michel Tissier, Toppan Photomasks France SAS (France)
David Au, Atmel Rousset SAS (France)
Stéphane Bonniol, Satin IP Technologies SAS (France)
Patrick Garcia, Atmel Rousset SAS (France)
Philippe Morey-Chaisemartin, XYALIS sarl (France)
Dominique Sadran, Toppan Photomasks France SAS (France)
Isabelle Servin, CEA, LETI (France)
Michel Tabusse, Satin IP Technologies SAS (France)

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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