Share Email Print

Proceedings Paper

Nano-pattern design and technology for patterned media magnetic recording
Author(s): Hiroyuki Kataoka; Yoshiyuki Hirayama; Thomas R. Albrecht; Masahito Kobayashi
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

About the patterned media magnetic recording technology, which is anticipated one of the new generation technologies to replace conventional perpendicular magnetic recording beyond 1Tb/in2, the technology back ground, two major options, performance expectations were discussed. Then the requirements for the template (mold) for the nano-imprint lithography, which is irreplaceable technology for pattern media, were discussed.

Paper Details

Date Published: 11 May 2009
PDF: 12 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790K (11 May 2009); doi: 10.1117/12.824261
Show Author Affiliations
Hiroyuki Kataoka, Hitachi Global Storage Technologies Japan, Ltd. (Japan)
Yoshiyuki Hirayama, Hitachi, Ltd.
Thomas R. Albrecht, Hitachi Global Storage Technologies, Inc. (United States)
Masahito Kobayashi, Hitachi Global Storage Technologies, Inc.

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

© SPIE. Terms of Use
Back to Top