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Proceedings Paper

Haze growth on reticles: What's the RigHT thing to do?
Author(s): Steven M. McDonald; Daniel V. Chalom; Michael J. Green; Jeffrey A. McMurran; Michael B. Garrett; David W. Dlouhy
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Paper Abstract

The authors are reporting on the comparison of various industry methods of managing, controlling and limiting haze growth on 193nm reticles. This comparison includes reporting on the results from the Reticle Haze Treatment (RigHT) process developed at Micron / Photronics Mask Technology Center and transferred to Photronics, Inc. This process provides 193nm PSM reticles that have shown no haze growth after excessive wafer exposures and are usable for the life of the reticle.

Paper Details

Date Published: 11 May 2009
PDF: 8 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790F (11 May 2009); doi: 10.1117/12.824256
Show Author Affiliations
Steven M. McDonald, Photronics, Inc. (United States)
Daniel V. Chalom, Photronics, Inc. (United States)
Michael J. Green, Photronics, Inc. (United States)
Jeffrey A. McMurran, Photronics, Inc. (United States)
Michael B. Garrett, Micron Technology, Inc. (United States)
David W. Dlouhy, Photronics, Inc. (United States)

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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