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Proceedings Paper

Adhesion control between resist patterns and photomask blank surfaces
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Paper Abstract

Most problems in photomask fabrication such as pattern collapse, haze, and cleaning damage are related to the behavior of surfaces and interfaces of resists, opaque layers, and quartz substrates. Therefore, it is important to control the corresponding surface and interface energies in photomask fabrication processes. In particular, adhesion analysis in microscopic regions is strongly desirable to optimize material and process designs in photomask fabrication. We applied the direct peeling (DP) method with a scanning probe microscope (SPM) tip and measured the adhesion of resist patterns on Cr and quartz surfaces for photomask process optimization. We measured adhesion and frictional forces between the resulting collapsed resist pillar and the Cr or the quartz surface before and after the sliding. We also studied the effect of surface property of the Cr and quartz surfaces to resist adhesion. The adhesion could be controlled by surface modification using silanes and surface roughness on Cr blanks. We also discuss the relationship between the adhesion observed with the DP method and the properties of the modified surfaces including water contact angles and local adhesive forces measured from force-distance curves with an SPM.

Paper Details

Date Published: 11 May 2009
PDF: 8 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790A (11 May 2009); doi: 10.1117/12.824251
Show Author Affiliations
Masaaki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Tokyo Institute of Technology (Japan)
Sho Hatakeyama, Dai Nippon Printing Co., Ltd. (Japan)
Kouji Yoshida, Dai Nippon Printing Co., Ltd. (Japan)
Takaharu Nagai, Dai Nippon Printing Co., Ltd. (Japan)
Daisuke Totsukawa, Dai Nippon Printing Co., Ltd. (Japan)
Masaharu Fukuda, Dai Nippon Printing Co., Ltd. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Ohtani, Tokyo Institute of Technology (Japan)
Masamichi Fujihira, Tokyo Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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