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Proceedings Paper

Effect of pellicle frame and adhesive material on final photomask flatness
Author(s): Nancy Zhou; Ken Racette; David Hasselbeck; Monica Barrett; Robert Nolan; Michael Caterer; Takashi Mizoguchi; Satoshi Akutagawa; Glenn Dickey; Toru Shirasaki
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Paper Abstract

Previous work has shown that photomask blank flatness as well as photomask patterning and pelliclization all play an important role in finished photomask flatness. Additional studies have shown that pellicle mounting techniques, pellicle adhesives, frame flatness and shape and pellicle mounting tools play a role as well. It has become clear that frame flexibility, coupled with frame mounting surface flatness and shape are the principal factors influencing the pellicle effect on the mask distortion. Pellicle suppliers have begun to evaluate various polymers as potential replacements for the standard aluminum frame in current use. The elasticity of the frame adhesive has also been adjusted to evaluate its effect on the pellicle influence on mask flatness. This paper describes some joint evaluations between IBM, Toppan and ShinEtsu, performed to determine the effect of pellicle frame composition,, mount surface flatness, adhesive elasticity and adhesive surface flatness on the distortion of photolithography masks. It demonstrates that polymer pellicle frames with more flexible adhesive improve finished mask flatness approximately the same amount as reducing the total frame standoff height of aluminum frames with conventional adhesive.

Paper Details

Date Published: 11 May 2009
PDF: 8 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737909 (11 May 2009); doi: 10.1117/12.824250
Show Author Affiliations
Nancy Zhou, IBM Corp. (United States)
Ken Racette, IBM Corp. (United States)
David Hasselbeck, IBM Corp. (United States)
Monica Barrett, IBM Corp. (United States)
Robert Nolan, IBM Corp. (United States)
Michael Caterer, IBM Corp. (United States)
Takashi Mizoguchi, Toppan Photomasks, Inc. (Japan)
Satoshi Akutagawa, Toppan Photomasks, Inc. (Japan)
Glenn Dickey, ShinEtsu Chemical Co. Ltd. (Japan)
Toru Shirasaki, ShinEtsu Chemical Co. Ltd. (Japan)

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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