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Proceedings Paper

Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors
Author(s): Regina Soufli; Sherry L. Baker; Jeff C. Robinson; Eric M. Gullikson; Tom J. McCarville; Michael J. Pivovaroff; Peter Stefan; Stefan P. Hau-Riege; Richard Bionta
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Paper Abstract

The development and properties of reflective coatings for the x-ray offset mirror systems of the Linac Coherent Light Source (LCLS) free-electron laser (FEL) are discussed in this manuscript. The uniquely high instantaneous dose of the LCLS FEL beam translates to strict limits in terms of materials choice, thus leading to an x-ray mirror design consisting of a reflective coating deposited on a silicon substrate. Coherent wavefront preservation requirements for these mirrors result in stringent surface figure and finish specifications. DC-magnetron sputtered B4C and SiC thin film coatings with optimized stress, roughness and figure properties for the LCLS x-ray mirrors are presented. The evolution of microstructure, morphology, and stress of these thin films versus deposition conditions is discussed. Experimental results on the performance of these coatings with respect to FEL damage are also presented.

Paper Details

Date Published: 18 May 2009
PDF: 9 pages
Proc. SPIE 7361, Damage to VUV, EUV, and X-Ray Optics II, 73610U (18 May 2009); doi: 10.1117/12.823836
Show Author Affiliations
Regina Soufli, Lawrence Livermore National Lab. (United States)
Sherry L. Baker, Lawrence Livermore National Lab. (United States)
Jeff C. Robinson, Lawrence Livermore National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Tom J. McCarville, Lawrence Livermore National Lab. (United States)
Michael J. Pivovaroff, Lawrence Livermore National Lab. (United States)
Peter Stefan, SLAC National Accelerator Lab. (United States)
Stefan P. Hau-Riege, Lawrence Livermore National Lab. (United States)
Richard Bionta, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 7361:
Damage to VUV, EUV, and X-Ray Optics II
Libor Juha; Saša Bajt; Ryszard Sobierajski, Editor(s)

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