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Proceedings Paper

Nanopolishing: parameters and techniques
Author(s): Aurelian Ovidius I. Trufasu; Virginia Maduta; Cristina Liliana Trufasu
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Paper Abstract

The thermal regime had to meet two needs: to be big enough for a fast polishing and small enough not to influence the support or piece. The dilatation coefficient is different for pieces and support make a modification of outside topography which influence the final shape of surface, consequently ΔN. The present study propose to establish a link between temperature uniformity in the same time on piece or polishing device surface, respectively, final quality of topography polished surface.

Paper Details

Date Published: 7 January 2009
PDF: 4 pages
Proc. SPIE 7297, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies IV, 72971L (7 January 2009); doi: 10.1117/12.823667
Show Author Affiliations
Aurelian Ovidius I. Trufasu, Politehnica Univ. of Bucharest (Romania)
Virginia Maduta, S.C. ProOptica S. A. (Romania)
Cristina Liliana Trufasu, Edmond Nicolau College (Romania)


Published in SPIE Proceedings Vol. 7297:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies IV
Paul Schiopu; Cornel Panait; George Caruntu; Adrian Manea, Editor(s)

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