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Proceedings Paper

Capillary Z-pinch discharge produced plasma EUV source
Author(s): Yongpeng Zhao; Qiang Xu; Xingqiang Zhang
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Paper Abstract

Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32nrn node and below. This paper elaborately describes the EUV source in our lab based on the capillary Z-pinch discharge produced plasma (DPP).

Paper Details

Date Published: 18 February 2009
PDF: 7 pages
Proc. SPIE 7276, Photonics and Optoelectronics Meetings (POEM) 2008: Laser Technology and Applications, 72761J (18 February 2009); doi: 10.1117/12.823433
Show Author Affiliations
Yongpeng Zhao, Harbin Institute of Technology (China)
Qiang Xu, Harbin Institute of Technology (China)
Xingqiang Zhang, Harbin Institute of Technology (China)


Published in SPIE Proceedings Vol. 7276:
Photonics and Optoelectronics Meetings (POEM) 2008: Laser Technology and Applications
Peixiang Lu; Katsumi Midorikawa; Bernd Wilhelmi, Editor(s)

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